REMOVAL METHOD OF MOISTURE FROM SUBSTRATE COATED WITH TRANSPARENT ELECTRODE

摘要

The moisture remaining in the substrate coated with the transparent electrode can be removed. Moreover, the process time for removing the moisture remaining in the substrate can be shortened. The method of removing moisture of the substrate is provided. A step(1-a) is for inputting the substrate in the infrared oven by carrying out the substrate in a cleaning device in which the substrate coated with the transparent electrode is cleaned. A step(1-b) is for heating the substrate within the infrared oven. A step(1-c) is for carrying out the substrate in the infrared oven. A step(1-d) is for loading the substrate within the chamber. A step(1-e) is for heat-treating the substrate while reducing the pressure of the chamber..