发明名称 |
METHOD OF FABRICATING A DEVICE WITH A CONCENTRATION GRADIENT AND THE CORRESPONDING DEVICE |
摘要 |
A semiconductive device is fabricated by forming, within a semiconductive substrate, at least one continuous region formed of a material having a non-uniform composition in a direction substantially perpendicular to the thickness of the substrate.
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申请公布号 |
US2008246121(A1) |
申请公布日期 |
2008.10.09 |
申请号 |
US20080061403 |
申请日期 |
2008.04.02 |
申请人 |
STMICROELECTRONICS (CROLLES 2) SAS |
发明人 |
BENSAHEL DANIEL-CAMILLE;MORAND YVES |
分类号 |
H01L21/20;H01L29/41 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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