ULTRASONIC DEVICE FOR CLEANING AND ULTRASONIC CLEANING SYSTEM USING THE SAME

摘要

An ultrasonic cleaning system using an ultrasonic cleaning device is provided to minimize damage of a wafer and to enhance a cleaning effect by distributing ultrasonic waves on the wafer. An ultrasonic device includes a plurality of piezoelectric elements(10) for diffusing beams and a diffusion layer(13). Each of the piezoelectric elements includes an anode deposited at one side thereof and a cathode deposited at the other side thereof. One side of the diffusion layer is attached to the piezoelectric elements. A cleaning bath(30) is attached to one side of the diffusion layer. The inside of the cleaning bath is filled with cleaning water. A power line(31) is formed to supply the power to the piezoelectric elements.