A method for measuring information about a substrate, and a substrate for use in a lithographic apparatus,申请号SG20050008373-传众专利搜索

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发明名称	A method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
摘要
申请公布号	SG123769(A1)	申请公布日期	2006.07.26
申请号	SG20050008373	申请日期	2005.12.23
申请人	ASML NETHERLANDS B.V.	发明人	LALBAHADOERSING SANJAYSINGH;PIETERS MARCO JOHANNES ANNEMARIE;HAUSCHILD JAN;VIN VAN DE COEN
分类号		主分类号
代理机构		代理人
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