| 发明名称 |
Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor |
| 摘要 |
A polymerizable monomer of the present invention is represented by the following formula (1);
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| 申请公布号 |
US2006058480(A1) |
申请公布日期 |
2006.03.16 |
| 申请号 |
US20040516176 |
申请日期 |
2004.11.30 |
| 申请人 |
DAICEL CHEMICAL INDUSTRIES, LTD. |
发明人 |
KOYAMA HIROSHI;TSUTSUMI KIYOHARU |
| 分类号 |
C08F214/18;C07D493/04;C08F16/26;C08F20/26;C08F20/30;G03F7/039 |
主分类号 |
C08F214/18 |
| 代理机构 |
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