发明名称 METHOD FOR MANUFACTURING THIN FILM, AND THIN FILM
摘要 PROBLEM TO BE SOLVED: To obtain a thin film having excellent quality in the case of forming the thin film by generating discharge plasma by using raw gas containing carbon source. SOLUTION: A base material 6 is installed on at least one of opposing electrodes 4, 5. Discharge plasma is generated by applying the pulse voltage between the opposing electrodes 4, 5 under the atmosphere containing raw material gas A containing carbon source, and a thin film 7 is generated on the base material 6. Positive pulse and negative pulse are applied as the pulse voltage, and the pulse half band width of the positive pulse and negative pulse is≤1,000 nsec. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006052453(A) 申请公布日期 2006.02.23
申请号 JP20040235992 申请日期 2004.08.13
申请人 NGK INSULATORS LTD 发明人 SAITO TAKAO;NAKAMURA YUKINORI;KONDO YOSHIMASA
分类号 C23C16/515;C23C16/27 主分类号 C23C16/515
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