发明名称 |
RADIATION GENERATING DEVICE, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device or a source for generating discharge producing plasma (DPP) radiation for combining advantages of the device or the source for generating DPP radiation and many of advantages of a laser producing plasma (LPP) source. <P>SOLUTION: The device for generating a radiation source based on a discharge includes a cathode and an anode. Material of the cathode and the anode is supplied in a fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or the anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode or the cathode or on a separate material located in between the anode and the cathode. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006032340(A) |
申请公布日期 |
2006.02.02 |
申请号 |
JP20050204148 |
申请日期 |
2005.07.13 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
KOSHELEV KONSTANTIN N;IVANOV VLADIMIR V;KOROB EVGENII D;ZUKAVISHVILI GIVI G;GAYAZOV ROBERT R;KRIVTSUN VLADIMIR M |
分类号 |
H05G2/00;G03F7/20;G21K1/00;G21K5/02;G21K5/08;H01L21/027 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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