Negative acting photoresist with improved blocking resistance

摘要

Novel compositions comprising photoactive urethane acrylate resins and an ethylenically unsaturated reactive diluent are disclosed. The urethane acrylate resin comprises the reaction product of a polyhydric acrylate monomer and an isocyanurate. The compositions find particular application in negative photoresist compositions and exhibit improved blocking resistance compared with other negative photoresist compositions. Methods for using the compositions are also disclosed.