| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing device and a polishing method, polishing a body to be polished to be more flat. <P>SOLUTION: This polishing apparatus includes: a pair of an upper surface plate 31a and a lower surface plate 31b having polishing surfaces on the opposite surfaces; a carrier group having a storing hole 41 for the body to be polished and composed of a plurality of disc-like carriers 33 annularly disposed between a pair of surface plates 31a, 31b; an inside gear body 35 provided in the central part of the carrier group disposed annularly and having a tooth part meshing with the tooth parts provided on the outer peripheral surfaces of the carriers 33; and an outside gear body 37 provided on the outside of the carrier group disposed annularly and having a tooth part meshing with the tooth parts of the carriers, wherein each carrier 33 is caused to revolve round the periphery of the inside gear body 35 while rotating on its axis by the inside bear body 35 and the outside gear body 37, thereby polishing the body 39 to be polished stored in the storing hole 41 of the carrier 33 with the polishing surfaces of the upper and lower surface plates 31a, 31b. Supposing that the outside gear body 37 is stationary, the rotating direction of the upper surface plate 31a and/or the lower surface plate 31b is the same direction as the rotating direction of the carrier 33 and the rotating angular speeds of the surface plates 31a, 31b are substantially equal to the rotating angular speed of the carrier 33. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
