发明名称 Non-volatile flash memory having a specific difference between source/floating gate and drain/floating gate overlapped portions
摘要 A structure of a non-volatile flash memory, in which a punch-through current is suppressed and the area of a memory cell is reduced, is provided. The non-volatile flash memory being a NOR type non-volatile flash memory provides floating gates and a common source line, and drains. And at the structure of the non-volatile flash memory, a region overlapped one of the drains and one of the floating gates in a memory cell is larger than a region overlapped the common source and one of the floating gates in the memory cell.
申请公布号 US6878984(B2) 申请公布日期 2005.04.12
申请号 US20010761693 申请日期 2001.01.18
申请人 NEC ELECTRONICS CORPORATION 发明人 TSUKIJI MASARU
分类号 H01L21/336;H01L21/44;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 H01L21/336
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