发明名称 |
METHOD FOR MANUFACTURING TFT, AND METHOD FOR MANUFACTURING DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a TFT wherein productivity is high and cost is low. SOLUTION: The method for manufacturing a TFT is characterized in that: a base film material is spread on the surface of a glass substrate 1 with ink jet system, and a base film 2 is formed; a polysilicon film formation process wherein an amorphous silicon film is formed on the surface of the base film 2 by plating or ordinary pressure chemical vapor deposition, the amorphous silicon film is made polycrystalline, and a polysilicon film 3 is formed; a mask pattern forming process wherein a first mask pattern 6 formed of graft polymer is formed on a surface of the polysilicon film 3; and a polysilicon island formation process wherein the polysilicon film 3 is etched by using the first mask pattern 6 and a polysilicon island 7 is formed. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005064034(A) |
申请公布日期 |
2005.03.10 |
申请号 |
JP20030207350 |
申请日期 |
2003.08.12 |
申请人 |
TOSHIBA CORP |
发明人 |
SAKURAI NAOAKI;YABUHARA HIDEHIKO;TONOTANI JUNICHI;HAYAMIZU NAOYA;MATSUNAKA SHIGEKI |
分类号 |
H01L21/283;G09F9/30;H01L21/288;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L21/283 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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