发明名称 |
GaN-BASED LED AND METHOD FOR MANUFACTURING THE SAME USING ETCHING TECHNIQUE FOR SAPPHIRE TO REDUCE SIZE OF DEVICE |
摘要 |
PURPOSE: A GaN-based LED and a method for manufacturing the same using an etching technique for sapphire is provided to reduce the size of a device and to increase the thickness of a basic substrate. CONSTITUTION: A GaN-based LED includes a sapphire basic substrate(20), a first conductive contact layer(12), a first electrode(18), a first clad layer(13), a light emitting layer(14), a second clad layer(15), a second conductive contact layer(16) and a second electrode(19). The first electrode is connected with the first conductive contact layer. The second electrode is formed on the second conductive contact layer. The sapphire basic substrate has a champer in the corner portion thereof.
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申请公布号 |
KR20050013046(A) |
申请公布日期 |
2005.02.02 |
申请号 |
KR20030096674 |
申请日期 |
2003.12.24 |
申请人 |
ITSWELL CO., LTD. |
发明人 |
CHOI, YONG SEOK;HAN, YOUNG HEON;KIM, CHANG YEON;KIM, SEONG JIN;YU, SOON JAE |
分类号 |
H01L33/20;H01L33/32;H01L33/46;(IPC1-7):H01L33/00 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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