发明名称 GaN-BASED LED AND METHOD FOR MANUFACTURING THE SAME USING ETCHING TECHNIQUE FOR SAPPHIRE TO REDUCE SIZE OF DEVICE
摘要 PURPOSE: A GaN-based LED and a method for manufacturing the same using an etching technique for sapphire is provided to reduce the size of a device and to increase the thickness of a basic substrate. CONSTITUTION: A GaN-based LED includes a sapphire basic substrate(20), a first conductive contact layer(12), a first electrode(18), a first clad layer(13), a light emitting layer(14), a second clad layer(15), a second conductive contact layer(16) and a second electrode(19). The first electrode is connected with the first conductive contact layer. The second electrode is formed on the second conductive contact layer. The sapphire basic substrate has a champer in the corner portion thereof.
申请公布号 KR20050013046(A) 申请公布日期 2005.02.02
申请号 KR20030096674 申请日期 2003.12.24
申请人 ITSWELL CO., LTD. 发明人 CHOI, YONG SEOK;HAN, YOUNG HEON;KIM, CHANG YEON;KIM, SEONG JIN;YU, SOON JAE
分类号 H01L33/20;H01L33/32;H01L33/46;(IPC1-7):H01L33/00 主分类号 H01L33/20
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