| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask for restricting effects of a deviation of a pattern due to thermal expansion during film formimg while forming a high-definition metal mask by using an additive method. SOLUTION: The mask is made of metal material suitable for pattern forming and a second metal film 12 is adhered and disposed on one face side other than an opening 13 of a first metal film 11 with the opening 13 of a desired pattern formed thereon. The second film 12 is made of a material of which the thermal expansion coefficient is 30-70% of the thermal expansion coefficient of the first film 11 and formed thinner than the first film 11. COPYRIGHT: (C)2005,JPO&NCIPI
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