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发明名称
研磨液组合物
摘要
本发明系提供一种研磨液组合物,其系包含水及氧化矽粒子、用于记忆体硬碟用基板者。其中上述氧化矽粒子为小粒径侧累积体积频率(%)对以穿透式电子显微镜(TEM)观测而得该氧化矽粒子之粒径(nm)作图所得该氧化矽粒子之粒径对累积体积频率图中,于粒径40~100nm范围内累积体积频率(V)相对于粒径(R)满足下式(1)之研磨液组合物;V≧0.5×R+40(1)。本发明之研磨液组合物特别适用于制造记忆体硬碟用基板等精密部件用基板。
申请公布号
TW200424297
申请公布日期
2004.11.16
申请号
TW092135389
申请日期
2003.12.15
申请人
花王股份有限公司
发明人
末永宪一;大岛良晓;萩原敏也
分类号
C09K3/14;C09G1/02
主分类号
C09K3/14
代理机构
代理人
陈长文
主权项
地址
日本
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