发明名称 |
DEVICE AND METHOD FOR PLASMA TREATMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and a method for a plasma treatment for efficiently making gases containing volatile and hazardous substances innoxious under an atmospheric pressure by controlling the formation of byproducts (N<SB>2</SB>O, NO<SB>X</SB>) in an electric discharge. <P>SOLUTION: The device for plasma treatment comprising a plasma reactor having a space for plasma treatment of gases by generating the electric discharge under the atmospheric pressure is characterized in that the above space for plasma treatment is equipped with a ground side electrode (3) and a high-tension side electrode (2); an inorganic dielectric (4) is loaded between the above ground side electrode and the above high-tension side electrode in the above space for plasma treatment; and another inorganic dielectric (5) having a different dielectric constant from that of the above inorganic dielectric (4) is loaded between the above inorganic dielectric (4) and at least one of the above ground side electrode and the above high-tension side electrode. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004181377(A) |
申请公布日期 |
2004.07.02 |
申请号 |
JP20020352093 |
申请日期 |
2002.12.04 |
申请人 |
CANON INC |
发明人 |
KANEKO YOSHIAKI;NISHIGUCHI TOSHIMOTO;AOYANAGI HIROMI;NAKAJIMA IKUO |
分类号 |
H05H1/24;B01D53/44;B01J19/08 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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