发明名称 In-situ thickness and refractive index monitoring and control system for thin film deposition
摘要 A method of determining thickness and refractive index of an optical thin film is described. The method includes generating a diagnostic light beam having a first and a second wavelength. The method also includes measuring unattenuated light intensities at the first and the second wavelength of the diagnostic light beam. The method also includes measuring attenuated light intensities at the first and the second wavelength of the diagnostic light beam after transmission through the optical thin film. A null light intensity for the diagnostic light beam at the first and second wavelength is also determined. A first and second normalized intensity function is determined using the measured unattenuated light intensities, the measured attenuated light intensities, and the measured null light intensities. The thickness and refractive index of the optical thin film is then determined by solving the first and second normalized intensity function for thickness and refractive index.
申请公布号 US6646753(B2) 申请公布日期 2003.11.11
申请号 US20010971374 申请日期 2001.10.04
申请人 UNAXIS, USA, INC. 发明人 ZHANG JIAN;PAN JING
分类号 G01B11/06;G01N21/39;G01N21/41;G01N21/59;G01N21/84;(IPC1-7):G01B11/06 主分类号 G01B11/06
代理机构 代理人
主权项
地址