发明名称 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a new chemically-amplified positive photoresist composition having so improved storage stability as to give a photospeed which is substantially constant with age. <P>SOLUTION: The chemically-amplified positive photoresist composition comprises a resin, a photoacid generator compound and an organic acid. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003177516(A) 申请公布日期 2003.06.27
申请号 JP20020236583 申请日期 2002.08.14
申请人 SHIPLEY CO LLC 发明人 CAMERON JAMES W;ABLAZA SHERI L
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
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