发明名称 Apparat zur Bestrahlung mit Elektronenstrahlen und Verfahren zur Bestrahlung mit Elektronenstrahlen
摘要 An electron beam exposure apparatus characterized by comprising an electron gun producing an electron beam, a first shaping member for shaping the cross-sectional shape of the electron beam, a second shaping member serving as a splitting member having a splitting part including splitting openings for splitting the electron beam into electron beams of different shapes, and a blocking member for blocking at least one of the electron beams.
申请公布号 DE10196180(T1) 申请公布日期 2003.03.27
申请号 DE2001196180T 申请日期 2001.10.24
申请人 ADVANTEST CORP., TOKIO/TOKYO 发明人 TANAKA, HITOSHI
分类号 G03F7/20;H01J37/305;H01J37/317;H01L21/027 主分类号 G03F7/20
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