发明名称 |
Apparat zur Bestrahlung mit Elektronenstrahlen und Verfahren zur Bestrahlung mit Elektronenstrahlen |
摘要 |
An electron beam exposure apparatus characterized by comprising an electron gun producing an electron beam, a first shaping member for shaping the cross-sectional shape of the electron beam, a second shaping member serving as a splitting member having a splitting part including splitting openings for splitting the electron beam into electron beams of different shapes, and a blocking member for blocking at least one of the electron beams. |
申请公布号 |
DE10196180(T1) |
申请公布日期 |
2003.03.27 |
申请号 |
DE2001196180T |
申请日期 |
2001.10.24 |
申请人 |
ADVANTEST CORP., TOKIO/TOKYO |
发明人 |
TANAKA, HITOSHI |
分类号 |
G03F7/20;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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