发明名称 Gas barrier film having polypropylene as a base film and method of manufacturing same
摘要 There is disclosed a gas barrier film having, as a base film, a polypropylene film, which makes it possible to take advantage of the excellent gas barrier property inherent to an SiOx thin film formed on the polypropylene film, and which is free from chlorine which would give a bad influence to the environment. This gas barrier film comprises a polypropylene film whose surface is bonded with tuning molecular chains having, as a main skeleton, an -O-Si-O- structure by enabling the oxygen (-O-) thereof to be bonded to carbon atoms of the surface of the polypropylene film, and an SiOx thin film formed on the surface of the polypropylene film where the tuning molecular chains are bonded, the SiOx thin film being bonded to the tuning molecular chains interposed between the polypropylene film and the SiOx thin film.
申请公布号 US2002098296(A1) 申请公布日期 2002.07.25
申请号 US20020058925 申请日期 2002.01.30
申请人 PRES. OF SHIZUOKA UNIV., A JAPANESE GOV. AGENCY 发明人 INAGAKI NORIHIRO;TASAKA SHIGERU;NAKAJIMA TETSUYA
分类号 B65D65/40;B32B9/00;B32B27/32;C08J7/04;C08J7/06;C23C16/02;C23C16/40;(IPC1-7):B05D3/02;B05D1/18;H05H1/24 主分类号 B65D65/40
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