Process for establishing mask lay-out data for simulating a lithographic process and for defining an optimized mask lay-out data

摘要

The method involves defining original data specifying an original layout and automatically computing new layout data similar to the original layout in terms of the geometry of a mask generated from the original data. The new data are computed based on rules related to deviations in layout geometry from a mask manufactured from this layout or modeled from the layout by following steps of a manufacturing process. The method involves predefining original data (12) specifying an original layout (10) and automatically computing new data (54) specifying a new layout (42) from the original data, whereby the new layout is similar to the original layout in terms of the geometry of a mask (22) generated from the original data. The new data are computed based on rules related to deviations in the geometry of a layout from a mask manufactured from this layout or modeled from the layout by following the steps of the manufacturing process. Independent claims are also included for the following: an arrangement for generating mask layout data, especially a data processing system, a program with a command sequence for implementation by a data processing system and an integrated circuit structure.