发明名称 Image-formation material and infrared absorber
摘要 <p>A heat mode-applicable image-formation material having high sensitivity and excellent image-forming property, and a novel infrared absorber which can be suitably used in this material. The present invention relates to a substrate carrying thereon an image-formation layer which contains an infrared absorption agent. The agent has at least one surface orientation group in the molecule, and solubility of the image-formation layer in an alkaline aqueous solution is changed by action of radiation in the near-infrared range. Preferable as the infrared absorbing agent is an infrared absorber comprising, in a molecule thereof, a fluorine-containing substituent which have at least 5 fluorine atoms, or a polymethine chain of at least 5 carbon atoms and an alkyl group of at least 8 carbon atoms, said alkyl group being connected to the polymethine chain via any of nitrogen, oxygen and sulfur.</p>
申请公布号 EP1162078(A2) 申请公布日期 2001.12.12
申请号 EP20010112937 申请日期 2001.06.06
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAKAMURA, IPPEI
分类号 G03F7/004;B41C1/10;B41M5/36;B41M5/46;B41N1/14;C08K5/17;C08K5/34;C08L101/00;C09B23/00;C09B23/01;C09B23/08;C09K3/00;G03F7/00;G03F7/027;G03F7/028;G03F7/032;G03F7/038;(IPC1-7):B41M5/40 主分类号 G03F7/004
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