Thin film forming method, thin film forming apparatus and solar cell

摘要

The present invention is to provide a thin film forming method and apparatus which make it possible to form a thin film having an excellent thickness uniformity over a large-sized substrate. According to the invention, there is provided a thin film forming method and apparatus comprising: a film forming chamber in which an inductive coupling electrode having a feeding portion and a grounding portion at its two ends is arranged; a high-frequency power source for feeding a high-frequency power to the feeding portion; and a waveform generator for amplitude-modulating the high-frequency power outputted from the high-frequency power source, whereby the amplitude-modulated high-frequency power is fed to the inductive coupling electrode to generate a plasma so that a thin film may be formed on a substrate arranged to face the inductive coupling electrode.