| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam device serving for inspecting or observing the shape of the sample surface by means of a band-shaped electron beam, capable of high-speed inspecting the conditions of the sample surface by not only applying the band-shaped beam to the sample but applying the same sample a negative voltage nearly equal to or slightly higher than the acceleration voltage given to the band-shaped beam so that the beam inverts at the point nearest to the sample surface and comes back, and by scanning by the band-shaped in beam the direction to the sample and in the other direction almost vertical thereof under the condition capable of detecting the electron inverted from the specular surface or non-specular surface of the sample. SOLUTION: The electron beam device consists of a means for generating a band-shaped beam of which the cross section is flat, high-voltage power generating and applying a negative voltage almost equal to or slightly higher than the acceleration voltage of the band-shaped beam given to the sample, a means for band-shaped beam scanning on the sample in the direction of the narrower width of the beam, a detector to detect the beam inverted from the sample surface or nearest points when scanning on the sample by means of the beam.
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