发明名称 |
Mfg. semiconductor disc with reflection degree exceeding 98 per cent by concatenation of process steps |
摘要 |
The concatenation comprises separating a mono-crystal by grinding, mechanical surface treatment, such as polishing, lapping and edge rounding, and mechanical and chemo-mechanical buffing steps .After each mechanical surface treatment the crystal grid structure of the semiconductor disc is examined by micro-Raman spectroscopy. The process steps and the used machines are monitored by the spectroscopic data.
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申请公布号 |
DE19951774(A1) |
申请公布日期 |
2001.05.10 |
申请号 |
DE19991051774 |
申请日期 |
1999.10.27 |
申请人 |
WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG |
发明人 |
EHLERT, ANDREAS;KERSTAN, MICHAEL;HELMREICH, DIETER |
分类号 |
H01L21/66;(IPC1-7):H01L21/66;H01L21/304 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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