发明名称 Mfg. semiconductor disc with reflection degree exceeding 98 per cent by concatenation of process steps
摘要 The concatenation comprises separating a mono-crystal by grinding, mechanical surface treatment, such as polishing, lapping and edge rounding, and mechanical and chemo-mechanical buffing steps .After each mechanical surface treatment the crystal grid structure of the semiconductor disc is examined by micro-Raman spectroscopy. The process steps and the used machines are monitored by the spectroscopic data.
申请公布号 DE19951774(A1) 申请公布日期 2001.05.10
申请号 DE19991051774 申请日期 1999.10.27
申请人 WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG 发明人 EHLERT, ANDREAS;KERSTAN, MICHAEL;HELMREICH, DIETER
分类号 H01L21/66;(IPC1-7):H01L21/66;H01L21/304 主分类号 H01L21/66
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