| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a laser processing system which can perform efficient laser processing and to provide an optical system suitable to be used for this system. SOLUTION: The laser processing system 10 is equipped with a pattern mask 14 to be irradiated with laser beams B1 from a laser oscillator 12, a diffraction optical element 36 to divide the incident beam B3 into N of diffracted beams B5 to exit, a first reduction optical system 32 to reduce the beam B2 from the pattern mask 14 to produce the incident beam B3 to the diffraction optical element 36, and a second reduction optical system 38 to reduce and project the diffracted beam B5 from the diffraction optical element 36 to the surface S to be processed. The two-stage reduction optical system 30 consists of the diffraction optical element 36 and first and second reduction optical systems 32, 38 positioned in the upstream and downstream sides of the element 36, respectively.</p> |
