| 摘要 |
PURPOSE: An exposure method is provided to produce high resolution and high precision pattern by now available x-ray exposure apparatus and mask. CONSTITUTION: An exposure method for exposing a workpiece in a proximity exposure system includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing , by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process. |
