发明名称 AQUEOUS COMPOSITION FOR ELUTION OF PHOTOSENSITIVE FLEXOGRAPHIC PLATE AND ITS APPLICATION
摘要 PROBLEM TO BE SOLVED: To obtain an aq. compsn. for elution of a photosensitive flexographic plate which shows elution property and plate making property the same as or higher than a chlorine-based org. solvent and which causes little pollution and has no inflammability. SOLUTION: This aq. compsn. for elution of a photosensitive flexographic plate consists of the following compsns. The compsns. are (a) 5 to 40 wt.% of monoalkylglycol, (b) 30 to 75 wt.% of org. solvent except for monoalkylglycol, having 150 to 300 deg.C boiling point under normal pressure and essentially comprised of carbon, hydrogen and/or oxygen, (c) 1 to 15 wt.% of surfactant, and (d) 10 to 30 wt.% of water.
申请公布号 JP2000137336(A) 申请公布日期 2000.05.16
申请号 JP19980325880 申请日期 1998.10.30
申请人 TOAGOSEI CO LTD;NIPPON DENSHI SEIKI KK;TOAGOSEI CO LTD 发明人 MARUNO MASANORI;KAWASHIMA TOMIO;OSAKABE TSUGIKATSU;KURITA MANABU
分类号 G03F7/00;G03F7/32;(IPC1-7):G03F7/32 主分类号 G03F7/00
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