发明名称 |
AQUEOUS COMPOSITION FOR ELUTION OF PHOTOSENSITIVE FLEXOGRAPHIC PLATE AND ITS APPLICATION |
摘要 |
PROBLEM TO BE SOLVED: To obtain an aq. compsn. for elution of a photosensitive flexographic plate which shows elution property and plate making property the same as or higher than a chlorine-based org. solvent and which causes little pollution and has no inflammability. SOLUTION: This aq. compsn. for elution of a photosensitive flexographic plate consists of the following compsns. The compsns. are (a) 5 to 40 wt.% of monoalkylglycol, (b) 30 to 75 wt.% of org. solvent except for monoalkylglycol, having 150 to 300 deg.C boiling point under normal pressure and essentially comprised of carbon, hydrogen and/or oxygen, (c) 1 to 15 wt.% of surfactant, and (d) 10 to 30 wt.% of water. |
申请公布号 |
JP2000137336(A) |
申请公布日期 |
2000.05.16 |
申请号 |
JP19980325880 |
申请日期 |
1998.10.30 |
申请人 |
TOAGOSEI CO LTD;NIPPON DENSHI SEIKI KK;TOAGOSEI CO LTD |
发明人 |
MARUNO MASANORI;KAWASHIMA TOMIO;OSAKABE TSUGIKATSU;KURITA MANABU |
分类号 |
G03F7/00;G03F7/32;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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