Blue edge emitting laser

摘要

An independently addressable, edge emitting semiconductor laser (200) emitting light in the blue wavelength range of 390 to 430 nanometers comprises a gallium nitride-based laser structure grown by selective area epitaxy and lateral mask overgrowth. By appropriate patterning of a dielectric mask (206) on the gallium nitride layer (204) on a sapphire substrate (202), areas in a second gallium nitride layer (210) can have a low defect density upon which the remainder of the laser structure (218-230) can be formed. <IMAGE>