发明名称 INTERFEROMETER SYSTEM WITH TWO WAVELENGTHS, AND LITHOGRAPHIC APPARATUS PROVIDED WITH SUCH A SYSTEM
摘要 <p>In an interferometer system, variations of the refractive index in the medium traversed by the measuring beam (123) can be detected by using two measuring beams (123, 125) having wavelengths which differ by a factor of three. For this choice of the wavelength ratio, the interference filters of the polarization elements, such as the beam splitter (127), the μ/4 plates (130, 131) and the antireflection coatings can be manufactured relatively easily, and the detection accuracy is increased.</p>
申请公布号 WO1999032848(A1) 申请公布日期 1999.07.01
申请号 IB1998002015 申请日期 1998.12.14
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