| 摘要 |
PCT No. PCT/JP91/00502 Sec. 371 Date Feb. 7, 1992 Sec. 102(e) Date Feb. 7, 1992 PCT Filed Apr. 17, 1991.A photoresist 12 is coated on a substrate 11, and a phase shift medium 13 is formed on the photoresist 12. The phase shift medium 13 is patterned. Thereafter, first and second laser beams 16 and 17 having asymmetric incidence angles with respect to the substrate 11 are radiated on the photoresist 12 to perform an interference exposing operation. The photoresist 12 is developed and post-baked, and the substrate 11 is etched using the photoresist 12 as a mask, thereby forming a diffraction grating having a discontinuous phase portion.
|
