发明名称 |
PHOTORESIST COMPOSITION COMPRISING A NON-AROMATIC RESIN HAVING NO AROMATIC STRUCTURES DERIVED FROM UNITS OF AN ALIPHATIC CYCLIC HYDROCARBON AND UNITS OF MALEIC ANHYDRIDE AND/OR MALEIMIDE AND A PHOTOSENSITIVE AGENT |
摘要 |
PCT No. PCT/JP89/00159 Sec. 371 Date Oct. 17, 1989 Sec. 102(e) Date Oct. 17, 1989 PCT Filed Feb. 17, 1989.A photoresist composition comprising: a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
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申请公布号 |
US5212043(A) |
申请公布日期 |
1993.05.18 |
申请号 |
US19900425191 |
申请日期 |
1990.10.17 |
申请人 |
TOSHO CORPORATION |
发明人 |
YAMAMOTO, TAKASHI;TODOKO, MASAAKI;SEITA, TORU;NAGAOKA, KYOKO;MATSUMURA, KOSABURO |
分类号 |
G03F7/012;G03F7/023 |
主分类号 |
G03F7/012 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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