发明名称 METHOD FOR FORMING PATTERNING THIN FILM AND SUBSTRATE-RETENTION TOOL USED FOR IT
摘要 PURPOSE:To prevent spreading of a film-forming particle into a shadow part of a wire mask by providing a wire mask on a surface of a substrate where a thin film is formed, setting up a baffle plate at its both sides, and by regulating incidence angle of the film-forming particle to a certain angle or less. CONSTITUTION:In this invention, a baffle plate 54 is set up while it is separated from a surface 3 at both sides along a wire mask 16 which is set up on the thin-film forming surface 3 and incidence angle theta1 of the film-forming particle for a direction of a normal 70 of the surface 3 is regulated to a certain angle or less by the baffle plate 54, thus preventing spreading of the film-forming particle to a shadow part of the wire mask even if the wire mask is not adhered onto a surface where the thin film is formed, disabling prevention of film formation at the shadow part of the baffle plate, obtaining a patterning thin film which is completely separated one another easily and stably, and achieving formation of the thin film and patterning simultaneously.
申请公布号 JPH04116925(A) 申请公布日期 1992.04.17
申请号 JP19900238504 申请日期 1990.09.07
申请人 KANEGAFUCHI CHEM IND CO LTD 发明人 FUJIWARA TAKASHI;ENDOU TOSHITO;HIRABAYASHI TAMA;YAMAGISHI HIDEO;OWADA YOSHIHISA
分类号 H01L31/04;H01L21/285 主分类号 H01L31/04
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