| 摘要 |
<p>PURPOSE:To allow the selective formation of plural colored layers on patterned transparent conductive films by forming TiOx films which function as light shielding films having the resistance value of >=10 times the resistance value of the transparent conductive films on a transparent substrate. CONSTITUTION:A transparent conductive film material is deposited by evaporation on the transparent substrate 1 to form the transparent conductive films 2. The transparent conductive films 2 are formed shorter in order of the part intended to be formed with red layers, the part intended to be formed with blue layers and the part intended to be formed with green layers. The TiOx films 3 (1<x<2) which function as the light shielding films having the resistance value of >=10 times the resistance value of the transparent conductive films 2 are then formed by an EB vapor deposition method and are coated with a photoresist opened in both end parts along the longitudinal direction of the transparent conductive films and the part intended to be formed with the colored layers for color sepn., etc. The window-frame shaped TiOx films 3 are then formed. The red layers are colored on the prescribed transparent conductive films 2 exposed form the window frame-shaped TiOx films 3 by an electrodeposition painting method to form the red layers. The plural colored layers are formed selectively on the patterned transparent conductive films in this way.</p> |
