摘要 |
<p>A charge coupled device (CCD) sensitive to infrared radiation composed of a succession of three layers of Group III-V semiconductor material. The layers are a window layer, a sensitive layer and a storage layer. The layers are fixed to a supporting plate serving as input for the radiation and as a rear surface of the device. The front surface of the device supports a plurality of control electrodes and at least one output electrode. The window layer and the storage layer of the CCD are made of a binary compound AB. The sensitive layer is made of an n-ary compound (A,X,Y . . . )III(B,M,N . . . )V having a larger forbidden energy band and a smaller absorption limit wavelength than the window and storage layers. The three layers of the device are formed by epitaxial growth on a substrate. The substrate is a layer of the binary compound AB coated with an epitaxial layer of the n-ary compound. The epitaxial substrate layer is a chemical blocking layer. The substrate and the chemical blocking layer are subsequently removed chemically.</p> |