| 摘要 |
<p>A semiconductor device comprising an amorphous semiconductor which might contain microcrystals and a metal electrode electrically connected to the amorphous semiconductor and containing Al as a first component wherein at least one element selected from the group consisting of (i)Ag, (ii)Au, (iii)Ca, Mg, Mn, W, Cr or Cu, (iv)Zn or Ge, and (v)Fe, Mo, Ni, Pd, Pt, Ti, V or Zr is added as an additional component of the metal electrode to the first component.</p><p>According to the present invention, one can prevent the diffusion of an element of a metal electrode into a semiconductor layer during the production and the use of a semiconductor device. In this way, the degradation of the properties of the semiconductor device can be substantially prevented. Further, the yield of products can be improved and their lifetime greatly lengthened.</p> |
