发明名称 |
Multilayer photoresist process utilizing cinnamic acid derivatives as absorbant dyes |
摘要 |
Spin castable polymethylmethacrylate photoresist compositions are provided utilizing certain cinnamic acid derivatives as dyes capable of absorbing light at about 436 nm and substantially transparent to light at about 220-250 nm. The spin castable polymethylmethacrylate resist compositions are used in making semiconductor devices by multilayer photoresist methods.
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申请公布号 |
US4535053(A) |
申请公布日期 |
1985.08.13 |
申请号 |
US19840619526 |
申请日期 |
1984.06.11 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
WEST, PAUL R.;GRIFFING, BRUCE F. |
分类号 |
G03C1/00;G03C1/72;G03F7/004;G03F7/039;G03F7/09;G03F7/26;H01L21/027;(IPC1-7):G03F7/02;G03C1/76 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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