| 摘要 |
PURPOSE:To perform development without leaving resist on wafers by a method wherein a photo resist developing equipment is composed of a developer supply pipe spraying a developer to the wafer surface, a means of spraying a washer to the wafer back, and the like above the a stage rotatable in the state of wafer mounting and above a wafer. CONSTITUTION:A splash-preventing plate 11 having a through hole through which the shaft core of the stage 8 is penetrated to the bottom plate 14 of a cover body 9 is provided horizontally, where the shaft core is penetrated, and the wafer 7 is mounted on the stage 8 and then covered with a whirl-up preventing plate 13 over the entire surface. The bottom 14 of the cover body 9 is provided with an exhaust pipe 15 penetrating through it and a back washing nozzle 12 exposed up to the front surface of the splash-preventing plate 11, and the whirl-up preventing plate 13 is covered with a cover 10 with the developer supply pipe 17, a mixer supply pipe 18, and a washer supply pipe 19 penetrated through the ceiling 16. Thus, the residual of photo resist on the back of the wafer 7 is prevented. |
