| 摘要 |
PURPOSE:To obtain the photoconductive powder having excellent moisture resistance by treating the CdS powder in a plasma atmosphere having 1% or more partial pressure of O2, and washing it with ion exchange resin and water. CONSTITUTION:An unstable component which is different from bulk is present on the surface of the CdS powder which is subjected to a series of heat treatment. Therefore the CdS powder is treated in the low temperature Ar gas plasma. The surface component is decomposed or altered by the bombardment of electrons, ions, and the like. A part of the powder is evaporated and sublimed, but most part is remained on the surface. Then, the ion exchange resin and CdS are put into water, and the residue is removed. If O2 having partial pressure of 1% or more is included in said atmosphere a water soluble product is effectively formed. In this constitution the unstable component is removed from the powder surface and the photoconductiv powder having excellent moisture resistance can be obtained. |
