| 摘要 |
Patterns to be drawn by a controlled electron beam producing system or a like system, as on a mask for integrated circuits, are classified into nonrepetitive and repetitive patterns. Each repetitive pattern is specified by those coordinates of an elementary pattern and those displacement and numbers of repetition of the elementary pattern which are stored in a data file as are the cases with coordinates of nonrepetitive patterns. In addition to a first register group for each of nonrepetitive patterns, a device for controlling production of the beam comprises a second register group for the data supplied thereto by accessing the data file only once for each repetitive pattern. A sequence controller repeatedly reads the coordinates of the elementary pattern from the register group, with the coordinates varied according to the displacements also read therefrom a plurality of times determined by those numbers of repetition which are also read therefrom.
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