| 摘要 |
PURPOSE:To display the analysis region in superposition on the analysis position by storing the analysis region in advance according to the magnifying power, accelerating voltage, and the average atomic number of a sample when analyzing the sample. CONSTITUTION:The region of a sample analyzed by the radiation of a charged particle beam is represented by an X-ray emission region larger than the secondary electron emission region and reflected electron emission region. The X-ray emission region radius determined experimentally or theoretically in advance is stored in a memory 22 as the function of the accelerating voltage of the charged particle beam and the average atomic number value of the sample. The average atomic number value and accelerating voltage value at the analysis point of the sample are inputted to a readout control unit 22a, and the X-ray emission region radius is read out from the memory 22b. This signal is inputted to a magnifying factor correcting unit 22c and corrected by the preset observation magnifying factor value and outputted, and the analysis region is displayed in superposition on the analysis point. |
