| 摘要 |
PURPOSE:To form a color filter accurately and easily and to obtain excellent display contrast by forming the color filter on a dummy electrode by an electrodepositing method and then forming a picture element electrode which is connected to a thin film transistor (TFT) on the color filter. CONSTITUTION:The TFT 21 and dummy electrode 32 for electrodeposition are formed on an insulation substrate 26 and then a protection film 42 for the TFT 21 is deposited on the entire surface of an insulation substrate 26. The entire surface of the protection film 42 is coated with photoresist 43, the respective parts of the photoresist 43 corresponding to the dummy electrode 32 for electrodeposition and part of the drain electrode of the TFT 21 are removed selectively, and the pattern of the photoresist 43 is used as a mask to etch the protection film 42 partially, thereby exposing the dummy electrode 32 for electrodeposition. The color filter 23 is formed by using the dummy electrode 32 and the picture element electrode 52 which is connected to the TFT 21 is formed thereupon. |
