发明名称 |
Lens system, in particular a projection lens system for semiconductor lithography |
摘要 |
In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).
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申请公布号 |
US2002167740(A1) |
申请公布日期 |
2002.11.14 |
申请号 |
US20020131957 |
申请日期 |
2002.04.25 |
申请人 |
OSTERRIED KARLFRID;PETASCH THOMAS;KUGLER JENS |
发明人 |
OSTERRIED KARLFRID;PETASCH THOMAS;KUGLER JENS |
分类号 |
G02B7/02;G02B13/14;G03F7/20;(IPC1-7):G02B7/02 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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