| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a metal-film-end detecting method which uses a high frequency wave that is easy to be built in a platen etc. in a polishing device, its space resolution is high, and certainly detects the polishing end of metal film in high accuracy. <P>SOLUTION: The metal-film-end detecting method uses a high frequency wave with which a predetermined metal film surface 8 is irradiated in a predetermine area so that the irradiated surface crosses the predetermined metal film 8, and which detects the polishing end of the predetermined metal film 8 on the basis of the inflection point which is generated in at least characteristics of either a reflected wave from the predetermined metal film 8, or a transmitted wave transmitted through the predetermined metal film 8 and wafer W. <P>COPYRIGHT: (C)2009,JPO&INPIT |
