METHOD FOR CLEANING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for cleaning a semiconductor device is provided to increase throughput and improve economical efficiency caused by collection of NH3 by using a super critical technology in cleaning a memory device and a non-memory device. CONSTITUTION: When a cassette(6) is mounted on a cassette container(2), super critical liquid is injected from an ammonia container to the cassette container. A cleaning process and a scrubbing process are performed in a state of high temperature and high pressure on the super critical liquid induced to the cassette container. All gas after the cleaning process and scrubbing process is induced to an ammonia collecting container(4) of a low temperature state. After the temperature and pressure of the ammonia collecting container is reduced to separate ammonia of a gas phase from ammonia of a liquid phase, purging gas of a purging gas container(3) of a high pressure is pushed to an ammonia storing container(1) and ammonia of a gas phase is exhausted to the ammonia collecting container so that ammonia gas is reused.