发明名称 PHOTOMASK CIRCUIT DETECTOR
摘要 Disclosed is a photomask circuit detector, comprising a working platform (1), a transverse beam (2), an enlarging device (3) and a display device (4). An exposure region (5) for placing a photomask is arranged on the working platform (1). A light box (6) is arranged under the exposure region (5). Two oppositely disposed rails (7) are arranged on the working platform (1). The transverse beam (2) is slidably mounted on the two rails (7). The enlarging device (3) is slidably mounted on the transverse beam (2). The display device (4) is electrically connected to the enlarging device (3). The photomask circuit detector can move the enlarging device (3) to an optional position in the exposure region (5) according to the requirements for detection to enlarge the circuit on the photomask to be detected. The enlarged image is output by the display device. By utilizing the photomask circuit detector, detection personnel can increase detecting speed, which saves detecting time. Furthermore, the detected result is more accurate and detecting costs are reduced. There is no need to move the photomask during detection, which prevents material from being scratched or worn and will not damage the exposure region (5).
申请公布号 WO2017000718(A1) 申请公布日期 2017.01.05
申请号 WO2016CN83655 申请日期 2016.05.27
申请人 EELY-ECW TECHNOLOGY LTD. 发明人 HU, Decai;LI, Chaoting;ZHANG, Yi
分类号 G03F1/44;G03F7/20 主分类号 G03F1/44
代理机构 代理人
主权项
地址