发明名称 |
METHOD FOR REFURBISHING SPENT RUTHENIUM OR RUTHENIUM ALLOY-BASED SPUTTERING TARGET, AND REFURBISHED RUTHENIUM OR RUTHENIUM ALLOY-BASED SPUTTERING TARGET WITH UNIFORM GRAINS PREPARED THEREBY |
摘要 |
The present invention provides a method for refurbishing a spent ruthenium (Ru) or Ru alloy-based sputtering target and an Ru or Ru alloy-based sputtering target refurbished by the method, the method comprising the steps of: (a) washing or cutting a spent Ru or Ru alloy-based sputtering target; (b) inserting the washed or cut spent target into a mold; (c) forming a laminate by charging a raw material powder having the same ingredient as the spent target into the mold in which the spent target has been inserted, and by flattening same; (d) forming a green compact by applying pressure to the laminate; and (e) sintering the green compact. |
申请公布号 |
WO2016068361(A1) |
申请公布日期 |
2016.05.06 |
申请号 |
WO2014KR10373 |
申请日期 |
2014.10.31 |
申请人 |
HEE SUNG METAL LTD |
发明人 |
KWON, OHJIB;HONG, GILSOO;YANG, SEUNGHO;YOON, WONKYU |
分类号 |
C23C14/34;C23C14/14;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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