发明名称 METHOD FOR REFURBISHING SPENT RUTHENIUM OR RUTHENIUM ALLOY-BASED SPUTTERING TARGET, AND REFURBISHED RUTHENIUM OR RUTHENIUM ALLOY-BASED SPUTTERING TARGET WITH UNIFORM GRAINS PREPARED THEREBY
摘要 The present invention provides a method for refurbishing a spent ruthenium (Ru) or Ru alloy-based sputtering target and an Ru or Ru alloy-based sputtering target refurbished by the method, the method comprising the steps of: (a) washing or cutting a spent Ru or Ru alloy-based sputtering target; (b) inserting the washed or cut spent target into a mold; (c) forming a laminate by charging a raw material powder having the same ingredient as the spent target into the mold in which the spent target has been inserted, and by flattening same; (d) forming a green compact by applying pressure to the laminate; and (e) sintering the green compact.
申请公布号 WO2016068361(A1) 申请公布日期 2016.05.06
申请号 WO2014KR10373 申请日期 2014.10.31
申请人 HEE SUNG METAL LTD 发明人 KWON, OHJIB;HONG, GILSOO;YANG, SEUNGHO;YOON, WONKYU
分类号 C23C14/34;C23C14/14;H01L21/285 主分类号 C23C14/34
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