发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method which enable improvement of a washing degree of a table to which a substrate is attached during polishing and a backing material.SOLUTION: A buff processing module 300A is an apparatus for performing buff processing to a processing object and includes: a buff table 400 including a support surface 402 for supporting the processing object; and a washing mechanism for washing the support surface 402 of the buff table 400 through physical contact.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016043472(A) |
申请公布日期 |
2016.04.04 |
申请号 |
JP20140171841 |
申请日期 |
2014.08.26 |
申请人 |
EBARA CORP |
发明人 |
YAMAGUCHI KUNIAKI;OBATA ITSUKI;MIZUNO TOSHIO |
分类号 |
B24B37/34;B24B29/00;H01L21/304 |
主分类号 |
B24B37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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