发明名称 |
Method for producing indium oxide-containing layers |
摘要 |
The present invention relates to a fluid phase method for producing indium oxide-containing layers, in which a composition comprising at least one indium oxo-alkoxide of the generic formula MxOy(OR)z[O(R′O)eH]aXbYc[R″OH]d with x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=1-20, d=0-25, e=0, 1, M=In, R, R′, R″=organic remainder, X═F, Cl, Br, I, and Y═—NO3, —NO2, where b+c is =1-20 and at least one solvent is applied to a substrate, optionally dried, and converted into an indium oxide-containing layer, to the indium oxo-alkoxides of the indicated generic formula, to coating compositions comprising said indium oxo-alkoxides, to layers that can be produced by means of the method according to the invention, and to the use of said layers. |
申请公布号 |
US9293326(B2) |
申请公布日期 |
2016.03.22 |
申请号 |
US201314407681 |
申请日期 |
2013.06.04 |
申请人 |
EVONIK DEGUSSA GmbH |
发明人 |
Steiger Juergen;Fruehling Dennis;Merkulov Alexey;Hoppe Arne |
分类号 |
H01L29/02;H01L21/02;C23C18/12;C23C18/14;H01L31/18;C07F5/00;H01L21/477;H01L29/24 |
主分类号 |
H01L29/02 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A liquid phase process for producing an indium oxide-containing layer, comprising:
applying to a substrate, a composition comprising i) an indium oxo alkoxide of the generic formula
MxOy(OR)z[O(R′O)eH]aXbYc[R″OH]d where
x=3-25,y=1-10,z=3-50,a=0-25,b=0-20,c=1-20,d=0-25,e=0, 1,M=In,R, R′, R″ are each an organic radical,X=F, Cl, Br, I,Y=—NO3, —NO2, with the proviso that b+c=1-20, and ii) solvent; and converting the coated substrate to an indium oxide-containing layer. |
地址 |
Essen DE |