A PLASMA GENERATING MODULE AND PLASMA PROCESS APPARATUS COMPRISING THE SAME

摘要

Provided are a plasma generating module and a plasma processing apparatus including the same. The plasma generating module comprises: a power load to which a radio frequency (RF) power is applied; a plurality of load units forming an inductive electric field by receiving the RF power, and divided into at least two load groups based on an impedance value; and at least two power distribution units provided to be movable in a lengthwise direction on the power load and transferring the RF power by being connected to different load groups respectively, thereby making RF power applied to each antenna uniform to eventually form uniform plasma.