发明名称 HEAD CLEANING UNIT AND APPARATUS FOR TREATING SUBSTRATE INCLUDING THE SAME
摘要 The present invention relates to a head cleaning unit cleaning a head discharging a solution in an inkjet method and an apparatus for treating a substrate including the same. The head cleaning unit cleaning a head including nozzles discharging a solution in an inkjet method according to an embodiment of the present invention comprises a body having a first area and a second area, including an opening formed upward in the longitudinal direction on the first area, and including a collecting space collecting chemicals inside, when the chemicals supplied to the head is discharged through the nozzles; and a suction nozzle absorbing the chemicals remaining in the head, and formed in the second area, wherein the head is moved from the first area to the second area in the first direction.
申请公布号 KR20150078639(A) 申请公布日期 2015.07.08
申请号 KR20130168194 申请日期 2013.12.31
申请人 SEMES CO., LTD. 发明人 PARK, TAE HYUN;LEE, BYUNG JOO;PARK, JUN WOO
分类号 B05B15/02 主分类号 B05B15/02
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